This first-of-its-kind complete reference on silicon semiconductor metrology describes cleanroom-based measurement technology used during the manufacture of silicon integrated circuits and covers model-based, critical dimension, overlay, acoustic film thickness, dopant dose, junction depth, and electrical measurements; particle and defect detection; and flatness following chemical mechanical polishing.

Surveys key areas such as optical measurements and in-line calibration methods!

Focuses on metrology for lithography, transistor, capacitor, and on-chip interconnect process technologies!

Containing nearly 1300 references, more than 300 equations, and nearly 500 drawings, photographs, and micrographs, the Handbook of Silicon Semiconductor Metrology

• details sensor-based process control, electrical test-based statistical metrology, and data management
  
• offers definitions of in situ, in-line, off-line, and integrated metrology
  
• emphasizes evaluating measurement capability, precision, and accuracy
  
• reveals the relationship between process flow and metrology
  
• assesses the scanning electron microscope and the whole-wafer-capable Auger-based defect review tools
  
• explains run-to-run and real-time control
  
• considers how to improve physical measurement methods to meet more exact requirements
  
• analyzes the increasingly sophisticated and costly information systems that store and extract information from data
  
• and more!
  

Providing examples of well-developed metrology capability to help process tool suppliers and integrated circuit manufacturers, the Handbook of Silicon Semiconductor Metrology is unparalleled for electrical, manufacturing, chemical, materials, process, optical, and process integration engineers; industrial physicists; and upper-level undergraduate and graduate students in these disciplines.