The purpose of this book is to help semiconductor inspection equipment users and manufacturers understand what nano dimensional standards are used to calibrate their equipment and how to employ them effectively. Reviewing trends and developments in nanoscale standards, the book starts with an introductory overview of nanometrological standards before proceeding to detail pitch standard, step height, line width, nano particle size, and surface roughness. This book is essential for users making quantitative nanoscale measurements, be that in a commercial or academic research setting, or involved in engineering nanometrology for quality control in industrial applications. Here the author provides an approachable understanding and application of the nanoscale standards in a practical context across a range of common nanoscale measurement modalities, including 3D, with particular emphasis on applications to AFM, an exceptional and arguably the most common technique used in nanometrology due to the ease of use and versatility of applications.